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	1.	Atomically controlled processing in silicon-based CVD epitaxial growth. [electronic resource] by Murota, Junichi Sakuraba, Masao Tillack, Bernd Producer: 20111206 In: Journal of nanoscience and nanotechnology vol. 11 Online resources: Available from publisher's website Availability: No items available. Save to lists Add to cart (remove)
	2.	Carrier properties of B atomic-layer-doped Si films grown by ECR Ar plasma-enhanced CVD without substrate heating. [electronic resource] by Sakuraba, Masao Sugawara, Katsutoshi Nosaka, Takayuki Akima, Hisanao Sato, Shigeo Publication details: Science and technology of advanced materials 2017 In: Science and technology of advanced materials vol. 18 Online resources: Available from publisher's website Availability: No items available. Save to lists Add to cart (remove)
	3.	Amphiphobic Septa Enhance the Mechanical Stability of Free-Standing Bilayer Lipid Membranes. [electronic resource] by Yamaura, Daichi Tadaki, Daisuke Araki, Shun Yoshida, Miyu Arata, Kohei Ohori, Takeshi Ishibashi, Ken-Ichi Kato, Miki Ma, Teng Miyata, Ryusuke Yamamoto, Hideaki Tero, Ryugo Sakuraba, Masao Ogino, Toshio Niwano, Michio Hirano-Iwata, Ayumi Producer: 20190403 In: Langmuir : the ACS journal of surfaces and colloids vol. 34 Online resources: Available from publisher's website Availability: No items available. Save to lists Add to cart (remove)

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