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	1.	The influence of process parameters and pulse ratio of precursors on the characteristics of La1 - x Al x O3 films deposited by atomic layer deposition. [electronic resource] by Fei, Chenxi Liu, Hongxia Wang, Xing Fan, Xiaojiao Producer: 20150518 In: Nanoscale research letters vol. 10 Online resources: Available from publisher's website Availability: No items available. Save to lists Add to cart (remove)
	2.	Effects of Rapid Thermal Annealing and Different Oxidants on the Properties of La [electronic resource] by Fei, Chenxi Liu, Hongxia Wang, Xing Zhao, Lu Zhao, Dongdong Feng, Xingyao Publication details: Nanoscale research letters Dec 2017 In: Nanoscale research letters vol. 12 Online resources: Available from publisher's website Availability: No items available. Save to lists Add to cart (remove)
	3.	Structural Properties Characterized by the Film Thickness and Annealing Temperature for La [electronic resource] by Wang, Xing Liu, Hongxia Zhao, Lu Fei, Chenxi Feng, Xingyao Chen, Shupeng Wang, Yongte Publication details: Nanoscale research letters Dec 2017 In: Nanoscale research letters vol. 12 Online resources: Available from publisher's website Availability: No items available. Save to lists Add to cart (remove)

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