The influence of process parameters and pulse ratio of precursors on the characteristics of La1 - x Al x O3 films deposited by atomic layer deposition. [electronic resource]

By: Contributor(s): Producer: 20150518Description: 180 p. digitalISSN:
  • 1931-7573
Online resources: In: Nanoscale research letters vol. 10
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Publication Type: Journal Article

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