The influence of process parameters and pulse ratio of precursors on the characteristics of La1 - x Al x O3 films deposited by atomic layer deposition.
Fei, Chenxi
The influence of process parameters and pulse ratio of precursors on the characteristics of La1 - x Al x O3 films deposited by atomic layer deposition. [electronic resource] - Nanoscale research letters 2015 - 180 p. digital
Publication Type: Journal Article
1931-7573
10.1186/s11671-015-0883-6 doi
The influence of process parameters and pulse ratio of precursors on the characteristics of La1 - x Al x O3 films deposited by atomic layer deposition. [electronic resource] - Nanoscale research letters 2015 - 180 p. digital
Publication Type: Journal Article
1931-7573
10.1186/s11671-015-0883-6 doi