Effect of the working gas of the ion-assisted source on the optical and mechanical properties of SiO2 films deposited by dual ion beam sputtering with Si and SiO2 as the starting materials. (Record no. 16307460)

MARC details
000 -LEADER
fixed length control field 00831 a2200205 4500
005 - DATE AND TIME OF LATEST TRANSACTION
control field 20250515025524.0
008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION
fixed length control field 200607s 0 0 eng d
022 ## - INTERNATIONAL STANDARD SERIAL NUMBER
International Standard Serial Number 1559-128X
024 7# - OTHER STANDARD IDENTIFIER
Standard number or code 10.1364/ao.45.003510
Source of number or code doi
040 ## - CATALOGING SOURCE
Original cataloging agency NLM
Language of cataloging eng
Transcribing agency NLM
100 1# - MAIN ENTRY--PERSONAL NAME
Personal name Wu, Jean-Yee
264 #0 - PRODUCTION, PUBLICATION, DISTRIBUTION, MANUFACTURE, AND COPYRIGHT NOTICE
Date of production, publication, distribution, manufacture, or copyright notice 20060717
245 00 - TITLE STATEMENT
Title Effect of the working gas of the ion-assisted source on the optical and mechanical properties of SiO2 films deposited by dual ion beam sputtering with Si and SiO2 as the starting materials.
Medium [electronic resource]
260 ## - PUBLICATION, DISTRIBUTION, ETC.
Name of publisher, distributor, etc. Applied optics
Date of publication, distribution, etc. May 2006
300 ## - PHYSICAL DESCRIPTION
Extent 3510-5 p.
Other physical details digital
500 ## - GENERAL NOTE
General note Publication Type: Journal Article
700 1# - ADDED ENTRY--PERSONAL NAME
Personal name Lee, Cheng-Chung
773 0# - HOST ITEM ENTRY
Title Applied optics
Related parts vol. 45
-- no. 15
-- p. 3510-5
856 40 - ELECTRONIC LOCATION AND ACCESS
Uniform Resource Identifier <a href="https://doi.org/10.1364/ao.45.003510">https://doi.org/10.1364/ao.45.003510</a>
Public note Available from publisher's website

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