Post-Cleaning Effect on a HfO2 Gate Stack Using a NF3/NH3 Plasma.
Lee, Min-Seon
Post-Cleaning Effect on a HfO2 Gate Stack Using a NF3/NH3 Plasma. [electronic resource] - Journal of nanoscience and nanotechnology May 2016 - 4808-13 p. digital
Publication Type: Journal Article; Research Support, Non-U.S. Gov't
1533-4899
10.1166/jnn.2016.12257 doi
Post-Cleaning Effect on a HfO2 Gate Stack Using a NF3/NH3 Plasma. [electronic resource] - Journal of nanoscience and nanotechnology May 2016 - 4808-13 p. digital
Publication Type: Journal Article; Research Support, Non-U.S. Gov't
1533-4899
10.1166/jnn.2016.12257 doi