| 000 | 00842 a2200217 4500 | ||
|---|---|---|---|
| 005 | 20250518101106.0 | ||
| 008 | ####s 0 0 eng d | ||
| 022 | _a1996-1944 | ||
| 024 | 7 |
_a10.3390/ma13092039 _2doi |
|
| 040 |
_aNLM _beng _cNLM |
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| 100 | 1 | _aSeifert, Marietta | |
| 245 | 0 | 0 |
_aPhase Formation and High-Temperature Stability of Very Thin Co-Sputtered Ti-Al and Multilayered Ti/Al Films on Thermally Oxidized Si Substrates. _h[electronic resource] |
| 260 |
_bMaterials (Basel, Switzerland) _cApr 2020 |
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| 500 | _aPublication Type: Journal Article | ||
| 700 | 1 | _aLattner, Eric | |
| 700 | 1 | _aMenzel, Siegfried B | |
| 700 | 1 | _aOswald, Steffen | |
| 700 | 1 | _aGemming, Thomas | |
| 773 | 0 |
_tMaterials (Basel, Switzerland) _gvol. 13 _gno. 9 |
|
| 856 | 4 | 0 |
_uhttps://doi.org/10.3390/ma13092039 _zAvailable from publisher's website |
| 999 |
_c30915251 _d30915251 |
||