| 000 | 00783 a2200205 4500 | ||
|---|---|---|---|
| 005 | 20250518085438.0 | ||
| 008 | ####s 0 0 eng d | ||
| 022 | _a2072-666X | ||
| 024 | 7 |
_a10.3390/mi11020211 _2doi |
|
| 040 |
_aNLM _beng _cNLM |
||
| 100 | 1 | _aDe Teresa, José María | |
| 245 | 0 | 0 |
_aErratum: De Teresa, J.M. et al. Comparison between Focused Electron/Ion Beam-Induced Deposition at Room Temperature and under Cryogenic Conditions. _h[electronic resource] |
| 260 |
_bMicromachines _cFeb 2020 |
||
| 500 | _aPublication Type: Published Erratum | ||
| 700 | 1 | _aOrús, Pablo | |
| 700 | 1 | _aCórdoba, Rosa | |
| 700 | 1 | _aPhilipp, Patrick | |
| 773 | 0 |
_tMicromachines _gvol. 11 _gno. 2 |
|
| 856 | 4 | 0 |
_uhttps://doi.org/10.3390/mi11020211 _zAvailable from publisher's website |
| 999 |
_c30660825 _d30660825 |
||