000 00822 a2200241 4500
005 20250518073514.0
008 ####s 0 0 eng d
022 _a2470-1343
024 7 _a10.1021/acsomega.9b02452
_2doi
040 _aNLM
_beng
_cNLM
100 1 _aWang, Yuancheng
245 0 0 _aRadio Frequency Plasma-Enhanced Reactive Magnetron Sputtering Deposition of α-SiN
_h[electronic resource]
260 _bACS omega
_cDec 2019
300 _a20205-20211 p.
_bdigital
500 _aPublication Type: Journal Article
700 1 _aQu, Hongwei
700 1 _aWang, Yufei
700 1 _aDong, Fengxin
700 1 _aChen, Zhonghao
700 1 _aZheng, Wanhua
773 0 _tACS omega
_gvol. 4
_gno. 23
_gp. 20205-20211
856 4 0 _uhttps://doi.org/10.1021/acsomega.9b02452
_zAvailable from publisher's website
999 _c30399173
_d30399173