000 01155 a2200349 4500
005 20250518073510.0
008 ####s 0 0 eng d
022 _a2055-7434
024 7 _a10.1038/s41378-019-0101-2
_2doi
040 _aNLM
_beng
_cNLM
100 1 _aCoulon, Pierre-Marie
245 0 0 _aDisplacement Talbot lithography for nano-engineering of III-nitride materials.
_h[electronic resource]
260 _bMicrosystems & nanoengineering
_c2019
300 _a52 p.
_bdigital
500 _aPublication Type: Journal Article
700 1 _aDamilano, Benjamin
700 1 _aAlloing, Blandine
700 1 _aChausse, Pierre
700 1 _aWalde, Sebastian
700 1 _aEnslin, Johannes
700 1 _aArmstrong, Robert
700 1 _aVézian, Stéphane
700 1 _aHagedorn, Sylvia
700 1 _aWernicke, Tim
700 1 _aMassies, Jean
700 1 _aZúñiga-Pérez, Jesus
700 1 _aWeyers, Markus
700 1 _aKneissl, Michael
700 1 _aShields, Philip A
773 0 _tMicrosystems & nanoengineering
_gvol. 5
_gp. 52
856 4 0 _uhttps://doi.org/10.1038/s41378-019-0101-2
_zAvailable from publisher's website
999 _c30398945
_d30398945