000 | 01155 a2200349 4500 | ||
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005 | 20250518073510.0 | ||
008 | ####s 0 0 eng d | ||
022 | _a2055-7434 | ||
024 | 7 |
_a10.1038/s41378-019-0101-2 _2doi |
|
040 |
_aNLM _beng _cNLM |
||
100 | 1 | _aCoulon, Pierre-Marie | |
245 | 0 | 0 |
_aDisplacement Talbot lithography for nano-engineering of III-nitride materials. _h[electronic resource] |
260 |
_bMicrosystems & nanoengineering _c2019 |
||
300 |
_a52 p. _bdigital |
||
500 | _aPublication Type: Journal Article | ||
700 | 1 | _aDamilano, Benjamin | |
700 | 1 | _aAlloing, Blandine | |
700 | 1 | _aChausse, Pierre | |
700 | 1 | _aWalde, Sebastian | |
700 | 1 | _aEnslin, Johannes | |
700 | 1 | _aArmstrong, Robert | |
700 | 1 | _aVézian, Stéphane | |
700 | 1 | _aHagedorn, Sylvia | |
700 | 1 | _aWernicke, Tim | |
700 | 1 | _aMassies, Jean | |
700 | 1 | _aZúñiga-Pérez, Jesus | |
700 | 1 | _aWeyers, Markus | |
700 | 1 | _aKneissl, Michael | |
700 | 1 | _aShields, Philip A | |
773 | 0 |
_tMicrosystems & nanoengineering _gvol. 5 _gp. 52 |
|
856 | 4 | 0 |
_uhttps://doi.org/10.1038/s41378-019-0101-2 _zAvailable from publisher's website |
999 |
_c30398945 _d30398945 |