000 | 00799 a2200217 4500 | ||
---|---|---|---|
005 | 20250518071651.0 | ||
008 | ####s 0 0 eng d | ||
022 | _a1996-1944 | ||
024 | 7 |
_a10.3390/ma12223795 _2doi |
|
040 |
_aNLM _beng _cNLM |
||
100 | 1 | _aChrostowski, Marta | |
245 | 0 | 0 |
_aAnnealing of Boron-Doped Hydrogenated Crystalline Silicon Grown at Low Temperature by PECVD. _h[electronic resource] |
260 |
_bMaterials (Basel, Switzerland) _cNov 2019 |
||
500 | _aPublication Type: Journal Article | ||
700 | 1 | _aAlvarez, José | |
700 | 1 | _aLe Donne, Alessia | |
700 | 1 | _aBinetti, Simona | |
700 | 1 | _aRoca I Cabarrocas, Pere | |
773 | 0 |
_tMaterials (Basel, Switzerland) _gvol. 12 _gno. 22 |
|
856 | 4 | 0 |
_uhttps://doi.org/10.3390/ma12223795 _zAvailable from publisher's website |
999 |
_c30337363 _d30337363 |