| 000 | 00853 a2200253 4500 | ||
|---|---|---|---|
| 005 | 20250518035655.0 | ||
| 008 | ####s 0 0 eng d | ||
| 022 | _a1094-4087 | ||
| 024 | 7 |
_a10.1364/OE.27.008021 _2doi |
|
| 040 |
_aNLM _beng _cNLM |
||
| 100 | 1 | _aKaneda, Yushi | |
| 245 | 0 | 0 |
_aScalable approach for continuous-wave deep-ultraviolet laser at 213nm. _h[electronic resource] |
| 260 |
_bOptics express _cMar 2019 |
||
| 300 |
_a8021-8026 p. _bdigital |
||
| 500 | _aPublication Type: Journal Article | ||
| 700 | 1 | _aTago, Tsuyoshi | |
| 700 | 1 | _aSasa, Toshiaki | |
| 700 | 1 | _aSasaura, Masahiro | |
| 700 | 1 | _aNakao, Hiroaki | |
| 700 | 1 | _aHirohashi, Junji | |
| 700 | 1 | _aFurukawa, Yasunori | |
| 773 | 0 |
_tOptics express _gvol. 27 _gno. 6 _gp. 8021-8026 |
|
| 856 | 4 | 0 |
_uhttps://doi.org/10.1364/OE.27.008021 _zAvailable from publisher's website |
| 999 |
_c29654912 _d29654912 |
||