000 00755 a2200217 4500
005 20250518022000.0
008 ####s 0 0 eng d
022 _a2072-666X
024 7 _a10.3390/mi9110542
_2doi
040 _aNLM
_beng
_cNLM
100 1 _aVazquez Bengochea, Leticia
245 0 0 _aCharacterization of CMP Slurries Using Densitometry and Refractive Index Measurements.
_h[electronic resource]
260 _bMicromachines
_cOct 2018
500 _aPublication Type: Journal Article
700 1 _aSampurno, Yasa
700 1 _aKavaljer, Marcus
700 1 _aJohnston, Rob
700 1 _aPhilipossian, Ara
773 0 _tMicromachines
_gvol. 9
_gno. 11
856 4 0 _uhttps://doi.org/10.3390/mi9110542
_zAvailable from publisher's website
999 _c29324760
_d29324760