000 00846 a2200229 4500
005 20250517170937.0
264 0 _c20180730
008 201807s 0 0 eng d
022 _a1944-8252
024 7 _a10.1021/acsami.7b07811
_2doi
040 _aNLM
_beng
_cNLM
100 1 _aZyulkov, Ivan
245 0 0 _aSelective Ru ALD as a Catalyst for Sub-Seven-Nanometer Bottom-Up Metal Interconnects.
_h[electronic resource]
260 _bACS applied materials & interfaces
_cSep 2017
300 _a31031-31041 p.
_bdigital
500 _aPublication Type: Journal Article
700 1 _aKrishtab, Mikhail
700 1 _aDe Gendt, Stefan
700 1 _aArmini, Silvia
773 0 _tACS applied materials & interfaces
_gvol. 9
_gno. 36
_gp. 31031-31041
856 4 0 _uhttps://doi.org/10.1021/acsami.7b07811
_zAvailable from publisher's website
999 _c27477764
_d27477764