| 000 | 01023 a2200289 4500 | ||
|---|---|---|---|
| 005 | 20250517075629.0 | ||
| 264 | 0 | _c20160614 | |
| 008 | 201606s 0 0 eng d | ||
| 022 | _a1094-4087 | ||
| 024 | 7 |
_a10.1364/OE.23.033249 _2doi |
|
| 040 |
_aNLM _beng _cNLM |
||
| 100 | 1 | _aSukhdeo, David S | |
| 245 | 0 | 0 |
_aGe microdisk with lithographically-tunable strain using CMOS-compatible process. _h[electronic resource] |
| 260 |
_bOptics express _cDec 2015 |
||
| 300 |
_a33249-54 p. _bdigital |
||
| 500 | _aPublication Type: Journal Article; Research Support, Non-U.S. Gov't; Research Support, U.S. Gov't, Non-P.H.S. | ||
| 700 | 1 | _aPetykiewicz, Jan | |
| 700 | 1 | _aGupta, Shashank | |
| 700 | 1 | _aKim, Daeik | |
| 700 | 1 | _aWoo, Sungdae | |
| 700 | 1 | _aKim, Youngmin | |
| 700 | 1 | _aVučković, Jelena | |
| 700 | 1 | _aSaraswat, Krishna C | |
| 700 | 1 | _aNam, Donguk | |
| 773 | 0 |
_tOptics express _gvol. 23 _gno. 26 _gp. 33249-54 |
|
| 856 | 4 | 0 |
_uhttps://doi.org/10.1364/OE.23.033249 _zAvailable from publisher's website |
| 999 |
_c25689789 _d25689789 |
||