000 01235 a2200349 4500
005 20250517075332.0
264 0 _c20161214
008 201612s 0 0 eng d
022 _a1521-4095
024 7 _a10.1002/adma.201505552
_2doi
040 _aNLM
_beng
_cNLM
100 1 _aProbst, Christian
245 0 0 _aAthermal Azobenzene-Based Nanoimprint Lithography.
_h[electronic resource]
260 _bAdvanced materials (Deerfield Beach, Fla.)
_cApr 2016
300 _a2624-8 p.
_bdigital
500 _aPublication Type: Journal Article; Research Support, Non-U.S. Gov't
650 0 4 _aAzo Compounds
_xchemistry
650 0 4 _aDimethylpolysiloxanes
_xchemistry
650 0 4 _aIsomerism
650 0 4 _aMicroscopy, Atomic Force
650 0 4 _aMicroscopy, Electron, Scanning
650 0 4 _aNanostructures
_xchemistry
650 0 4 _aNanotechnology
650 0 4 _aUltraviolet Rays
700 1 _aMeichner, Christoph
700 1 _aKreger, Klaus
700 1 _aKador, Lothar
700 1 _aNeuber, Christian
700 1 _aSchmidt, Hans-Werner
773 0 _tAdvanced materials (Deerfield Beach, Fla.)
_gvol. 28
_gno. 13
_gp. 2624-8
856 4 0 _uhttps://doi.org/10.1002/adma.201505552
_zAvailable from publisher's website
999 _c25680940
_d25680940