| 000 | 01012 a2200289 4500 | ||
|---|---|---|---|
| 005 | 20250517002020.0 | ||
| 264 | 0 | _c20150331 | |
| 008 | 201503s 0 0 eng d | ||
| 022 | _a1944-8252 | ||
| 024 | 7 |
_a10.1021/am505221g _2doi |
|
| 040 |
_aNLM _beng _cNLM |
||
| 100 | 1 | _aFang, Ming | |
| 245 | 0 | 0 |
_aPolymer-confined colloidal monolayer: a reusable soft photomask for rapid wafer-scale nanopatterning. _h[electronic resource] |
| 260 |
_bACS applied materials & interfaces _cDec 2014 |
||
| 300 |
_a20837-41 p. _bdigital |
||
| 500 | _aPublication Type: Journal Article; Research Support, Non-U.S. Gov't | ||
| 700 | 1 | _aLin, Hao | |
| 700 | 1 | _aCheung, Ho-Yuen | |
| 700 | 1 | _aXiu, Fei | |
| 700 | 1 | _aShen, Lifan | |
| 700 | 1 | _aYip, SenPo | |
| 700 | 1 | _aPun, Edwin Yue-Bun | |
| 700 | 1 | _aWong, Chun-Yuen | |
| 700 | 1 | _aHo, Johnny C | |
| 773 | 0 |
_tACS applied materials & interfaces _gvol. 6 _gno. 23 _gp. 20837-41 |
|
| 856 | 4 | 0 |
_uhttps://doi.org/10.1021/am505221g _zAvailable from publisher's website |
| 999 |
_c24333841 _d24333841 |
||