| 000 | 00948 a2200253 4500 | ||
|---|---|---|---|
| 005 | 20250516235328.0 | ||
| 264 | 0 | _c20150331 | |
| 008 | 201503s 0 0 eng d | ||
| 022 | _a1944-8252 | ||
| 024 | 7 |
_a10.1021/am5048834 _2doi |
|
| 040 |
_aNLM _beng _cNLM |
||
| 100 | 1 | _aChoi, Yuri | |
| 245 | 0 | 0 |
_aHighly efficient layer-by-layer-assisted infiltration for high-performance and cost-effective fabrication of nanoelectrodes. _h[electronic resource] |
| 260 |
_bACS applied materials & interfaces _cOct 2014 |
||
| 300 |
_a17352-7 p. _bdigital |
||
| 500 | _aPublication Type: Journal Article; Research Support, Non-U.S. Gov't | ||
| 700 | 1 | _aChoi, Sihyuk | |
| 700 | 1 | _aJeong, Hu Young | |
| 700 | 1 | _aLiu, Meilin | |
| 700 | 1 | _aKim, Byeong-Su | |
| 700 | 1 | _aKim, Guntae | |
| 773 | 0 |
_tACS applied materials & interfaces _gvol. 6 _gno. 20 _gp. 17352-7 |
|
| 856 | 4 | 0 |
_uhttps://doi.org/10.1021/am5048834 _zAvailable from publisher's website |
| 999 |
_c24251842 _d24251842 |
||