000 01071 a2200301 4500
005 20250516215528.0
264 0 _c20150330
008 201503s 0 0 eng d
022 _a1613-6829
024 7 _a10.1002/smll.201400971
_2doi
040 _aNLM
_beng
_cNLM
100 1 _aKim, Bong Hoon
245 0 0 _aNegative-tone block copolymer lithography by in situ surface chemical modification.
_h[electronic resource]
260 _bSmall (Weinheim an der Bergstrasse, Germany)
_cOct 2014
300 _a4207-12 p.
_bdigital
500 _aPublication Type: Journal Article; Research Support, Non-U.S. Gov't
700 1 _aByeon, Kyeong-Jae
700 1 _aKim, Ju Young
700 1 _aKim, Jinseung
700 1 _aJin, Hyeong Min
700 1 _aCho, Joong-Yeon
700 1 _aJeong, Seong-Jun
700 1 _aShin, Jonghwa
700 1 _aLee, Heon
700 1 _aKim, Sang Ouk
773 0 _tSmall (Weinheim an der Bergstrasse, Germany)
_gvol. 10
_gno. 20
_gp. 4207-12
856 4 0 _uhttps://doi.org/10.1002/smll.201400971
_zAvailable from publisher's website
999 _c23903148
_d23903148