| 000 | 00799 a2200205 4500 | ||
|---|---|---|---|
| 005 | 20250516151000.0 | ||
| 264 | 0 | _c20140107 | |
| 008 | 201401s 0 0 eng d | ||
| 022 | _a1521-3773 | ||
| 024 | 7 |
_a10.1002/anie.201300755 _2doi |
|
| 040 |
_aNLM _beng _cNLM |
||
| 100 | 1 | _aKolasinski, Kurt W | |
| 245 | 0 | 0 |
_aThe stoichiometry of electroless silicon etching in solutions of V2O5 and HF. _h[electronic resource] |
| 260 |
_bAngewandte Chemie (International ed. in English) _cJun 2013 |
||
| 300 |
_a6731-4 p. _bdigital |
||
| 500 | _aPublication Type: Journal Article | ||
| 700 | 1 | _aBarclay, William B | |
| 773 | 0 |
_tAngewandte Chemie (International ed. in English) _gvol. 52 _gno. 26 _gp. 6731-4 |
|
| 856 | 4 | 0 |
_uhttps://doi.org/10.1002/anie.201300755 _zAvailable from publisher's website |
| 999 |
_c22744456 _d22744456 |
||