000 00912 a2200265 4500
005 20250516121403.0
264 0 _c20130815
008 201308s 0 0 eng d
022 _a1879-2723
024 7 _a10.1016/j.ultramic.2012.08.003
_2doi
040 _aNLM
_beng
_cNLM
100 1 _aLiu, Zhuang
245 0 0 _aReflection-based near-field ellipsometry for thin film characterization.
_h[electronic resource]
260 _bUltramicroscopy
_cJan 2013
300 _a26-34 p.
_bdigital
500 _aPublication Type: Journal Article
650 0 4 _aNanostructures
_xultrastructure
650 0 4 _aSpectroscopy, Near-Infrared
_xmethods
700 1 _aZhang, Ying
700 1 _aKok, Shaw Wei
700 1 _aNg, Boon Ping
700 1 _aSoh, Yeng Chai
773 0 _tUltramicroscopy
_gvol. 124
_gp. 26-34
856 4 0 _uhttps://doi.org/10.1016/j.ultramic.2012.08.003
_zAvailable from publisher's website
999 _c22255245
_d22255245