| 000 | 00855 a2200217 4500 | ||
|---|---|---|---|
| 005 | 20250516082605.0 | ||
| 264 | 0 | _c20120320 | |
| 008 | 201203s 0 0 eng d | ||
| 022 | _a1533-4880 | ||
| 024 | 7 |
_a10.1166/jnn.2011.4096 _2doi |
|
| 040 |
_aNLM _beng _cNLM |
||
| 100 | 1 | _aChopra, Siddheshwar | |
| 245 | 0 | 0 |
_aHydrogen dependent surface morphology study of plasma deposited SiN(x):H films for two gas systems SiH4/NH3 and SiH4/N2. _h[electronic resource] |
| 260 |
_bJournal of nanoscience and nanotechnology _cDec 2011 |
||
| 300 |
_a11216-21 p. _bdigital |
||
| 500 | _aPublication Type: Journal Article | ||
| 700 | 1 | _aGupta, R P | |
| 700 | 1 | _aBanerjee, Souri | |
| 773 | 0 |
_tJournal of nanoscience and nanotechnology _gvol. 11 _gno. 12 _gp. 11216-21 |
|
| 856 | 4 | 0 |
_uhttps://doi.org/10.1166/jnn.2011.4096 _zAvailable from publisher's website |
| 999 |
_c21614294 _d21614294 |
||