000 01150 a2200349 4500
005 20250516064417.0
264 0 _c20111206
008 201112s 0 0 eng d
022 _a1533-4880
024 7 _a10.1166/jnn.2011.5024
_2doi
040 _aNLM
_beng
_cNLM
100 1 _aHellwig, Malte
245 0 0 _aAtomic vapor deposition approach to In2O3 thin films.
_h[electronic resource]
260 _bJournal of nanoscience and nanotechnology
_cSep 2011
300 _a8094-100 p.
_bdigital
500 _aPublication Type: Journal Article
700 1 _aParala, Harish
700 1 _aCybinksa, Joanna
700 1 _aBarreca, Davide
700 1 _aGasparotto, Alberto
700 1 _aNiermann, Benedikt
700 1 _aBecker, Hans-Werner
700 1 _aRogalla, Detlef
700 1 _aFeydt, Jürgen
700 1 _aIrsen, Stephan
700 1 _aMudring, Anja-Verena
700 1 _aWinter, Jörg
700 1 _aFischer, Roland A
700 1 _aDevi, Anjana
773 0 _tJournal of nanoscience and nanotechnology
_gvol. 11
_gno. 9
_gp. 8094-100
856 4 0 _uhttps://doi.org/10.1166/jnn.2011.5024
_zAvailable from publisher's website
999 _c21324980
_d21324980