000 | 01150 a2200349 4500 | ||
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005 | 20250516064417.0 | ||
264 | 0 | _c20111206 | |
008 | 201112s 0 0 eng d | ||
022 | _a1533-4880 | ||
024 | 7 |
_a10.1166/jnn.2011.5024 _2doi |
|
040 |
_aNLM _beng _cNLM |
||
100 | 1 | _aHellwig, Malte | |
245 | 0 | 0 |
_aAtomic vapor deposition approach to In2O3 thin films. _h[electronic resource] |
260 |
_bJournal of nanoscience and nanotechnology _cSep 2011 |
||
300 |
_a8094-100 p. _bdigital |
||
500 | _aPublication Type: Journal Article | ||
700 | 1 | _aParala, Harish | |
700 | 1 | _aCybinksa, Joanna | |
700 | 1 | _aBarreca, Davide | |
700 | 1 | _aGasparotto, Alberto | |
700 | 1 | _aNiermann, Benedikt | |
700 | 1 | _aBecker, Hans-Werner | |
700 | 1 | _aRogalla, Detlef | |
700 | 1 | _aFeydt, Jürgen | |
700 | 1 | _aIrsen, Stephan | |
700 | 1 | _aMudring, Anja-Verena | |
700 | 1 | _aWinter, Jörg | |
700 | 1 | _aFischer, Roland A | |
700 | 1 | _aDevi, Anjana | |
773 | 0 |
_tJournal of nanoscience and nanotechnology _gvol. 11 _gno. 9 _gp. 8094-100 |
|
856 | 4 | 0 |
_uhttps://doi.org/10.1166/jnn.2011.5024 _zAvailable from publisher's website |
999 |
_c21324980 _d21324980 |