000 01068 a2200301 4500
005 20250516060224.0
264 0 _c20120306
008 201203s 0 0 eng d
022 _a1520-5827
024 7 _a10.1021/la202899v
_2doi
040 _aNLM
_beng
_cNLM
100 1 _aYoshizawa, Koki
245 0 0 _aExclusion of impurity particles during grain growth in charged colloidal crystals.
_h[electronic resource]
260 _bLangmuir : the ACS journal of surfaces and colloids
_cNov 2011
300 _a13420-7 p.
_bdigital
500 _aPublication Type: Journal Article
650 0 4 _aColloids
650 0 4 _aCrystallization
650 0 4 _aElectrophoretic Mobility Shift Assay
650 0 4 _aFluorescence
650 0 4 _aMicroscopy, Confocal
700 1 _aOkuzono, Tohru
700 1 _aKoga, Tsuyoshi
700 1 _aTaniji, Tomohiro
700 1 _aYamanaka, Junpei
773 0 _tLangmuir : the ACS journal of surfaces and colloids
_gvol. 27
_gno. 22
_gp. 13420-7
856 4 0 _uhttps://doi.org/10.1021/la202899v
_zAvailable from publisher's website
999 _c21206695
_d21206695