| 000 | 00808 a2200229 4500 | ||
|---|---|---|---|
| 005 | 20250516043842.0 | ||
| 264 | 0 | _c20121002 | |
| 008 | 201210s 0 0 eng d | ||
| 022 | _a1556-276X | ||
| 024 | 7 |
_a10.1186/1556-276X-6-172 _2doi |
|
| 040 |
_aNLM _beng _cNLM |
||
| 100 | 1 | _aKhomenkova, Larysa | |
| 245 | 0 | 0 |
_aHf-based high-k materials for Si nanocrystal floating gate memories. _h[electronic resource] |
| 260 |
_bNanoscale research letters _cFeb 2011 |
||
| 300 |
_a172 p. _bdigital |
||
| 500 | _aPublication Type: Journal Article | ||
| 700 | 1 | _aSahu, Bhabani S | |
| 700 | 1 | _aSlaoui, Abdelilah | |
| 700 | 1 | _aGourbilleau, Fabrice | |
| 773 | 0 |
_tNanoscale research letters _gvol. 6 _gno. 1 _gp. 172 |
|
| 856 | 4 | 0 |
_uhttps://doi.org/10.1186/1556-276X-6-172 _zAvailable from publisher's website |
| 999 |
_c20965121 _d20965121 |
||