| 000 | 00830 a2200229 4500 | ||
|---|---|---|---|
| 005 | 20250516005402.0 | ||
| 264 | 0 | _c20121002 | |
| 008 | 201210s 0 0 eng d | ||
| 022 | _a1559-128X | ||
| 024 | 7 |
_a10.1364/AO.34.000676 _2doi |
|
| 040 |
_aNLM _beng _cNLM |
||
| 100 | 1 | _aNeitzert, H C | |
| 245 | 0 | 0 |
_aIn situ thickness control during plasma deposition of hydrogenated amorphous silicon films by time-resolved microwave conductivity measurements. _h[electronic resource] |
| 260 |
_bApplied optics _cFeb 1995 |
||
| 300 |
_a676-80 p. _bdigital |
||
| 500 | _aPublication Type: Journal Article | ||
| 700 | 1 | _aHirsch, W | |
| 700 | 1 | _aKunst, M | |
| 700 | 1 | _aNell, M E | |
| 773 | 0 |
_tApplied optics _gvol. 34 _gno. 4 _gp. 676-80 |
|
| 856 | 4 | 0 |
_uhttps://doi.org/10.1364/AO.34.000676 _zAvailable from publisher's website |
| 999 |
_c20265851 _d20265851 |
||