| 000 | 01037 a2200313 4500 | ||
|---|---|---|---|
| 005 | 20250516004711.0 | ||
| 264 | 0 | _c20110202 | |
| 008 | 201102s 0 0 eng d | ||
| 022 | _a1094-4087 | ||
| 024 | 7 |
_a10.1364/OE.18.020968 _2doi |
|
| 040 |
_aNLM _beng _cNLM |
||
| 100 | 1 | _aVoelkel, Reinhard | |
| 245 | 0 | 0 |
_aAdvanced mask aligner lithography: new illumination system. _h[electronic resource] |
| 260 |
_bOptics express _cSep 2010 |
||
| 300 |
_a20968-78 p. _bdigital |
||
| 500 | _aPublication Type: Journal Article; Research Support, Non-U.S. Gov't | ||
| 700 | 1 | _aVogler, Uwe | |
| 700 | 1 | _aBich, Andreas | |
| 700 | 1 | _aPernet, Pascal | |
| 700 | 1 | _aWeible, Kenneth J | |
| 700 | 1 | _aHornung, Michael | |
| 700 | 1 | _aZoberbier, Ralph | |
| 700 | 1 | _aCullmann, Elmar | |
| 700 | 1 | _aStuerzebecher, Lorenz | |
| 700 | 1 | _aHarzendorf, Torsten | |
| 700 | 1 | _aZeitner, Uwe D | |
| 773 | 0 |
_tOptics express _gvol. 18 _gno. 20 _gp. 20968-78 |
|
| 856 | 4 | 0 |
_uhttps://doi.org/10.1364/OE.18.020968 _zAvailable from publisher's website |
| 999 |
_c20244767 _d20244767 |
||