| 000 | 01072 a2200301 4500 | ||
|---|---|---|---|
| 005 | 20250516004709.0 | ||
| 264 | 0 | _c20110222 | |
| 008 | 201102s 0 0 eng d | ||
| 022 | _a1094-4087 | ||
| 024 | 7 |
_a10.1364/OE.18.019485 _2doi |
|
| 040 |
_aNLM _beng _cNLM |
||
| 100 | 1 | _aStuerzebecher, Lorenz | |
| 245 | 0 | 0 |
_aAdvanced mask aligner lithography: fabrication of periodic patterns using pinhole array mask and Talbot effect. _h[electronic resource] |
| 260 |
_bOptics express _cSep 2010 |
||
| 300 |
_a19485-94 p. _bdigital |
||
| 500 | _aPublication Type: Journal Article | ||
| 650 | 0 | 4 | _aEquipment Design |
| 650 | 0 | 4 | _aEquipment Failure Analysis |
| 650 | 0 | 4 |
_aLighting _xinstrumentation |
| 650 | 0 | 4 |
_aPhotography _xinstrumentation |
| 650 | 0 | 4 |
_aRefractometry _xinstrumentation |
| 700 | 1 | _aHarzendorf, Torsten | |
| 700 | 1 | _aVogler, Uwe | |
| 700 | 1 | _aZeitner, Uwe D | |
| 700 | 1 | _aVoelkel, Reinhard | |
| 773 | 0 |
_tOptics express _gvol. 18 _gno. 19 _gp. 19485-94 |
|
| 856 | 4 | 0 |
_uhttps://doi.org/10.1364/OE.18.019485 _zAvailable from publisher's website |
| 999 |
_c20244620 _d20244620 |
||