| 000 | 00928 a2200289 4500 | ||
|---|---|---|---|
| 005 | 20250516002902.0 | ||
| 264 | 0 | _c20130704 | |
| 008 | 201307s 0 0 eng d | ||
| 022 | _a1559-128X | ||
| 024 | 7 |
_a10.1364/AO.32.007022 _2doi |
|
| 040 |
_aNLM _beng _cNLM |
||
| 100 | 1 | _aAttwood, D | |
| 245 | 0 | 0 |
_aUndulator radiation for at-wavelength interferometry of optics for extreme-ultraviolet lithography. _h[electronic resource] |
| 260 |
_bApplied optics _cDec 1993 |
||
| 300 |
_a7022-31 p. _bdigital |
||
| 500 | _aPublication Type: Journal Article | ||
| 700 | 1 | _aSommargren, G | |
| 700 | 1 | _aBeguiristain, R | |
| 700 | 1 | _aNguyen, K | |
| 700 | 1 | _aBokor, J | |
| 700 | 1 | _aCeglio, N | |
| 700 | 1 | _aJackson, K | |
| 700 | 1 | _aKoike, M | |
| 700 | 1 | _aUnderwood, J | |
| 773 | 0 |
_tApplied optics _gvol. 32 _gno. 34 _gp. 7022-31 |
|
| 856 | 4 | 0 |
_uhttps://doi.org/10.1364/AO.32.007022 _zAvailable from publisher's website |
| 999 |
_c20186706 _d20186706 |
||