000 01069 a2200361 4500
005 20250515234216.0
264 0 _c20101217
008 201012s 0 0 eng d
022 _a1879-2723
024 7 _a10.1016/j.ultramic.2010.07.007
_2doi
040 _aNLM
_beng
_cNLM
100 1 _aSchmidt, Th
245 0 0 _aDouble aberration correction in a low-energy electron microscope.
_h[electronic resource]
260 _bUltramicroscopy
_cOct 2010
300 _a1358-61 p.
_bdigital
500 _aPublication Type: Journal Article
700 1 _aMarchetto, H
700 1 _aLévesque, P L
700 1 _aGroh, U
700 1 _aMaier, F
700 1 _aPreikszas, D
700 1 _aHartel, P
700 1 _aSpehr, R
700 1 _aLilienkamp, G
700 1 _aEngel, W
700 1 _aFink, R
700 1 _aBauer, E
700 1 _aRose, H
700 1 _aUmbach, E
700 1 _aFreund, H-J
773 0 _tUltramicroscopy
_gvol. 110
_gno. 11
_gp. 1358-61
856 4 0 _uhttps://doi.org/10.1016/j.ultramic.2010.07.007
_zAvailable from publisher's website
999 _c20030576
_d20030576