| 000 | 00735 a2200229 4500 | ||
|---|---|---|---|
| 005 | 20250515211246.0 | ||
| 264 | 0 | _c20121002 | |
| 008 | 201210s 0 0 eng d | ||
| 022 | _a1559-128X | ||
| 024 | 7 |
_a10.1364/AO.17.002556 _2doi |
|
| 040 |
_aNLM _beng _cNLM |
||
| 100 | 1 | _aKawabe, M | |
| 245 | 0 | 0 |
_aEffects of ion etching on the properties of GaAs. _h[electronic resource] |
| 260 |
_bApplied optics _cAug 1978 |
||
| 300 |
_a2556-61 p. _bdigital |
||
| 500 | _aPublication Type: Journal Article | ||
| 700 | 1 | _aKanzaki, N | |
| 700 | 1 | _aMasuda, K | |
| 700 | 1 | _aNamba, S | |
| 773 | 0 |
_tApplied optics _gvol. 17 _gno. 16 _gp. 2556-61 |
|
| 856 | 4 | 0 |
_uhttps://doi.org/10.1364/AO.17.002556 _zAvailable from publisher's website |
| 999 |
_c19571199 _d19571199 |
||