000 00915 a2200277 4500
005 20250515161814.0
264 0 _c20090511
008 200905s 0 0 eng d
022 _a0146-9592
024 7 _a10.1364/ol.34.000659
_2doi
040 _aNLM
_beng
_cNLM
100 1 _aTeo, E J
245 0 0 _aFabrication of low-loss silicon-on-oxidized-porous-silicon strip waveguide using focused proton-beam irradiation.
_h[electronic resource]
260 _bOptics letters
_cMar 2009
300 _a659-61 p.
_bdigital
500 _aPublication Type: Journal Article
700 1 _aBettiol, A A
700 1 _aYang, P
700 1 _aBreese, M B H
700 1 _aXiong, B Q
700 1 _aMashanovich, G Z
700 1 _aHeadley, W R
700 1 _aReed, G T
773 0 _tOptics letters
_gvol. 34
_gno. 5
_gp. 659-61
856 4 0 _uhttps://doi.org/10.1364/ol.34.000659
_zAvailable from publisher's website
999 _c18693781
_d18693781