| 000 | 01117 a2200325 4500 | ||
|---|---|---|---|
| 005 | 20250515151038.0 | ||
| 264 | 0 | _c20090212 | |
| 008 | 200902s 0 0 eng d | ||
| 022 | _a1089-7623 | ||
| 024 | 7 |
_a10.1063/1.3020709 _2doi |
|
| 040 |
_aNLM _beng _cNLM |
||
| 100 | 1 | _aPetcu, M C | |
| 245 | 0 | 0 |
_aA capacitive probe with shaped probe bias for ion flux measurements in depositing plasmas. _h[electronic resource] |
| 260 |
_bThe Review of scientific instruments _cNov 2008 |
||
| 300 |
_a115104 p. _bdigital |
||
| 500 | _aPublication Type: Journal Article | ||
| 650 | 0 | 4 | _aElectric Power Supplies |
| 650 | 0 | 4 | _aElectricity |
| 650 | 0 | 4 |
_aElectron Probe Microanalysis _xinstrumentation |
| 650 | 0 | 4 | _aIons |
| 650 | 0 | 4 | _aReference Standards |
| 650 | 0 | 4 |
_aSilicon Compounds _xchemistry |
| 700 | 1 | _aBronneberg, A C | |
| 700 | 1 | _aSarkar, A | |
| 700 | 1 | _aBlauw, M A | |
| 700 | 1 | _aCreatore, M | |
| 700 | 1 | _avan de Sanden, M C M | |
| 773 | 0 |
_tThe Review of scientific instruments _gvol. 79 _gno. 11 _gp. 115104 |
|
| 856 | 4 | 0 |
_uhttps://doi.org/10.1063/1.3020709 _zAvailable from publisher's website |
| 999 |
_c18500792 _d18500792 |
||