| 000 | 00846 a2200229 4500 | ||
|---|---|---|---|
| 005 | 20250515143527.0 | ||
| 264 | 0 | _c20081216 | |
| 008 | 200812s 0 0 eng d | ||
| 022 | _a1359-7345 | ||
| 024 | 7 |
_a10.1039/b807428c _2doi |
|
| 040 |
_aNLM _beng _cNLM |
||
| 100 | 1 | _aChen, Ching-Shiun | |
| 245 | 0 | 0 |
_aLow-temperature water gas shift reaction on Cu/SiO2 prepared by an atomic layer epitaxy technique. _h[electronic resource] |
| 260 |
_bChemical communications (Cambridge, England) _cOct 2008 |
||
| 300 |
_a4983-5 p. _bdigital |
||
| 500 | _aPublication Type: Journal Article | ||
| 700 | 1 | _aLin, Jarrn-Horng | |
| 700 | 1 | _aLai, Tzu-Wen | |
| 700 | 1 | _aLai, Tzn-Wen | |
| 773 | 0 |
_tChemical communications (Cambridge, England) _gno. 40 _gp. 4983-5 |
|
| 856 | 4 | 0 |
_uhttps://doi.org/10.1039/b807428c _zAvailable from publisher's website |
| 999 |
_c18395061 _d18395061 |
||