000 01117 a2200301 4500
005 20250515061803.0
264 0 _c20070622
008 200706s 0 0 eng d
022 _a0002-7863
024 7 _a10.1021/ja070490w
_2doi
040 _aNLM
_beng
_cNLM
100 1 _aNeuman, Daniel
245 0 0 _aPhotosensitized NO release from water-soluble nanoparticle assemblies.
_h[electronic resource]
260 _bJournal of the American Chemical Society
_cApr 2007
300 _a4146-7 p.
_bdigital
500 _aPublication Type: Journal Article; Research Support, N.I.H., Extramural; Research Support, U.S. Gov't, Non-P.H.S.
650 0 4 _aNanoparticles
_xchemistry
650 0 4 _aNitric Oxide
_xchemistry
650 0 4 _aPhotochemistry
650 0 4 _aSolubility
650 0 4 _aWater
_xchemistry
700 1 _aOstrowski, Alexis D
700 1 _aAbsalonson, Ryan O
700 1 _aStrouse, Geoffrey F
700 1 _aFord, Peter C
773 0 _tJournal of the American Chemical Society
_gvol. 129
_gno. 14
_gp. 4146-7
856 4 0 _uhttps://doi.org/10.1021/ja070490w
_zAvailable from publisher's website
999 _c16922378
_d16922378