000 | 01117 a2200301 4500 | ||
---|---|---|---|
005 | 20250515061803.0 | ||
264 | 0 | _c20070622 | |
008 | 200706s 0 0 eng d | ||
022 | _a0002-7863 | ||
024 | 7 |
_a10.1021/ja070490w _2doi |
|
040 |
_aNLM _beng _cNLM |
||
100 | 1 | _aNeuman, Daniel | |
245 | 0 | 0 |
_aPhotosensitized NO release from water-soluble nanoparticle assemblies. _h[electronic resource] |
260 |
_bJournal of the American Chemical Society _cApr 2007 |
||
300 |
_a4146-7 p. _bdigital |
||
500 | _aPublication Type: Journal Article; Research Support, N.I.H., Extramural; Research Support, U.S. Gov't, Non-P.H.S. | ||
650 | 0 | 4 |
_aNanoparticles _xchemistry |
650 | 0 | 4 |
_aNitric Oxide _xchemistry |
650 | 0 | 4 | _aPhotochemistry |
650 | 0 | 4 | _aSolubility |
650 | 0 | 4 |
_aWater _xchemistry |
700 | 1 | _aOstrowski, Alexis D | |
700 | 1 | _aAbsalonson, Ryan O | |
700 | 1 | _aStrouse, Geoffrey F | |
700 | 1 | _aFord, Peter C | |
773 | 0 |
_tJournal of the American Chemical Society _gvol. 129 _gno. 14 _gp. 4146-7 |
|
856 | 4 | 0 |
_uhttps://doi.org/10.1021/ja070490w _zAvailable from publisher's website |
999 |
_c16922378 _d16922378 |