000 00831 a2200205 4500
005 20250515025524.0
264 0 _c20060717
008 200607s 0 0 eng d
022 _a1559-128X
024 7 _a10.1364/ao.45.003510
_2doi
040 _aNLM
_beng
_cNLM
100 1 _aWu, Jean-Yee
245 0 0 _aEffect of the working gas of the ion-assisted source on the optical and mechanical properties of SiO2 films deposited by dual ion beam sputtering with Si and SiO2 as the starting materials.
_h[electronic resource]
260 _bApplied optics
_cMay 2006
300 _a3510-5 p.
_bdigital
500 _aPublication Type: Journal Article
700 1 _aLee, Cheng-Chung
773 0 _tApplied optics
_gvol. 45
_gno. 15
_gp. 3510-5
856 4 0 _uhttps://doi.org/10.1364/ao.45.003510
_zAvailable from publisher's website
999 _c16307460
_d16307460