000 | 01259 a2200337 4500 | ||
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005 | 20250515020614.0 | ||
264 | 0 | _c20060525 | |
008 | 200605s 0 0 eng d | ||
022 | _a0002-7863 | ||
024 | 7 |
_a10.1021/ja058836v _2doi |
|
040 |
_aNLM _beng _cNLM |
||
100 | 1 | _aLu, Yuerui | |
245 | 0 | 0 |
_aDNA functionalization of carbon nanotubes for ultrathin atomic layer deposition of high kappa dielectrics for nanotube transistors with 60 mV/decade switching. _h[electronic resource] |
260 |
_bJournal of the American Chemical Society _cMar 2006 |
||
300 |
_a3518-9 p. _bdigital |
||
500 | _aPublication Type: Journal Article; Research Support, Non-U.S. Gov't | ||
650 | 0 | 4 |
_aDNA _xchemistry |
650 | 0 | 4 | _aElectrochemistry |
650 | 0 | 4 | _aModels, Molecular |
650 | 0 | 4 |
_aNanotubes, Carbon _xchemistry |
650 | 0 | 4 |
_aPoly T _xchemistry |
650 | 0 | 4 |
_aSilicon Dioxide _xchemistry |
650 | 0 | 4 | _aTransistors, Electronic |
700 | 1 | _aBangsaruntip, Sarunya | |
700 | 1 | _aWang, Xinran | |
700 | 1 | _aZhang, Li | |
700 | 1 | _aNishi, Yoshio | |
700 | 1 | _aDai, Hongjie | |
773 | 0 |
_tJournal of the American Chemical Society _gvol. 128 _gno. 11 _gp. 3518-9 |
|
856 | 4 | 0 |
_uhttps://doi.org/10.1021/ja058836v _zAvailable from publisher's website |
999 |
_c16145416 _d16145416 |