000 01379 a2200421 4500
005 20250514184805.0
264 0 _c20040610
008 200406s 0 0 eng d
022 _a1476-1122
024 7 _a10.1038/nmat1117
_2doi
040 _aNLM
_beng
_cNLM
100 1 _aSaf, Robert
245 0 0 _aThin organic films by atmospheric-pressure ion deposition.
_h[electronic resource]
260 _bNature materials
_cMay 2004
300 _a323-9 p.
_bdigital
500 _aPublication Type: Evaluation Study; Journal Article; Research Support, Non-U.S. Gov't
650 0 4 _aAtmospheric Pressure
650 0 4 _aComputer Simulation
650 0 4 _aCrystallization
_xmethods
650 0 4 _aElectrochemistry
_xmethods
650 0 4 _aElectrodes
650 0 4 _aGases
_xchemistry
650 0 4 _aHot Temperature
650 0 4 _aIons
650 0 4 _aMaterials Testing
650 0 4 _aMembranes, Artificial
650 0 4 _aModels, Chemical
650 0 4 _aNanotechnology
_xinstrumentation
650 0 4 _aOrganic Chemicals
_xchemistry
650 0 4 _aSurface Properties
700 1 _aGoriup, Marian
700 1 _aSteindl, Thomas
700 1 _aHamedinger, Thomas E
700 1 _aSandholzer, Daniel
700 1 _aHayn, Gertraude
773 0 _tNature materials
_gvol. 3
_gno. 5
_gp. 323-9
856 4 0 _uhttps://doi.org/10.1038/nmat1117
_zAvailable from publisher's website
999 _c14809813
_d14809813