000 01432 a2200409 4500
005 20250514074800.0
264 0 _c20031118
008 200311s 0 0 eng d
022 _a1533-4880
024 7 _a10.1166/jnn.2002.092
_2doi
040 _aNLM
_beng
_cNLM
100 1 _aJohnson, J W
245 0 0 _aPerformance of AlGaN/GaN high electron mobility transistors at nanoscale gate lengths.
_h[electronic resource]
260 _bJournal of nanoscience and nanotechnology
_c
300 _a325-32 p.
_bdigital
500 _aPublication Type: Evaluation Study; Journal Article; Research Support, U.S. Gov't, Non-P.H.S.
650 0 4 _aAluminum
_xchemistry
650 0 4 _aAmplifiers, Electronic
650 0 4 _aCrystallization
_xmethods
650 0 4 _aElectrochemistry
_xinstrumentation
650 0 4 _aElectrons
650 0 4 _aEquipment Design
650 0 4 _aEquipment Failure Analysis
_xmethods
650 0 4 _aGallium
_xchemistry
650 0 4 _aMaterials Testing
_xmethods
650 0 4 _aMiniaturization
650 0 4 _aNanotechnology
_xinstrumentation
650 0 4 _aTransistors, Electronic
700 1 _aRen, F
700 1 _aPearton, S J
700 1 _aBaca, A G
700 1 _aHan, J
700 1 _aDabiran, A M
700 1 _aChow, P P
773 0 _tJournal of nanoscience and nanotechnology
_gvol. 2
_gno. 3-4
_gp. 325-32
856 4 0 _uhttps://doi.org/10.1166/jnn.2002.092
_zAvailable from publisher's website
999 _c12682782
_d12682782