000 00801 a2200229 4500
005 20250514071022.0
264 0 _c20030717
008 200307s 0 0 eng d
022 _a0031-9007
024 7 _a10.1103/PhysRevLett.90.186101
_2doi
040 _aNLM
_beng
_cNLM
100 1 _aBongiorno, Angelo
245 0 0 _aTransition structure at the Si(100)-SiO2 interface.
_h[electronic resource]
260 _bPhysical review letters
_cMay 2003
300 _a186101 p.
_bdigital
500 _aPublication Type: Journal Article
700 1 _aPasquarello, Alfredo
700 1 _aHybertsen, Mark S
700 1 _aFeldman, L C
773 0 _tPhysical review letters
_gvol. 90
_gno. 18
_gp. 186101
856 4 0 _uhttps://doi.org/10.1103/PhysRevLett.90.186101
_zAvailable from publisher's website
999 _c12571501
_d12571501