000 00788 a2200229 4500
005 20250514011651.0
264 0 _c20011025
008 200110s 0 0 eng d
022 _a0031-9007
024 7 _a10.1103/PhysRevLett.87.136102
_2doi
040 _aNLM
_beng
_cNLM
100 1 _aZhao, Y P
245 0 0 _aMorphology transition during low-pressure chemical vapor deposition.
_h[electronic resource]
260 _bPhysical review letters
_cSep 2001
300 _a136102 p.
_bdigital
500 _aPublication Type: Journal Article
700 1 _aDrotar, J T
700 1 _aWang, G C
700 1 _aLu, T M
773 0 _tPhysical review letters
_gvol. 87
_gno. 13
_gp. 136102
856 4 0 _uhttps://doi.org/10.1103/PhysRevLett.87.136102
_zAvailable from publisher's website
999 _c11502086
_d11502086