| 000 | 00788 a2200229 4500 | ||
|---|---|---|---|
| 005 | 20250514011651.0 | ||
| 264 | 0 | _c20011025 | |
| 008 | 200110s 0 0 eng d | ||
| 022 | _a0031-9007 | ||
| 024 | 7 |
_a10.1103/PhysRevLett.87.136102 _2doi |
|
| 040 |
_aNLM _beng _cNLM |
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| 100 | 1 | _aZhao, Y P | |
| 245 | 0 | 0 |
_aMorphology transition during low-pressure chemical vapor deposition. _h[electronic resource] |
| 260 |
_bPhysical review letters _cSep 2001 |
||
| 300 |
_a136102 p. _bdigital |
||
| 500 | _aPublication Type: Journal Article | ||
| 700 | 1 | _aDrotar, J T | |
| 700 | 1 | _aWang, G C | |
| 700 | 1 | _aLu, T M | |
| 773 | 0 |
_tPhysical review letters _gvol. 87 _gno. 13 _gp. 136102 |
|
| 856 | 4 | 0 |
_uhttps://doi.org/10.1103/PhysRevLett.87.136102 _zAvailable from publisher's website |
| 999 |
_c11502086 _d11502086 |
||