| 000 | 01066 a2200289 4500 | ||
|---|---|---|---|
| 005 | 20250514005523.0 | ||
| 264 | 0 | _c20010906 | |
| 008 | 200109s 0 0 eng d | ||
| 022 | _a0909-0495 | ||
| 024 | 7 |
_a10.1107/s090904950001712x _2doi |
|
| 040 |
_aNLM _beng _cNLM |
||
| 100 | 1 | _aYamashita, H | |
| 245 | 0 | 0 |
_aApplication of ion beam techniques for preparation of metal ion-implanted TiO2 thin film photocatalyst available under visible light irradiation: metal ion-implantation and ionized cluster beam method. _h[electronic resource] |
| 260 |
_bJournal of synchrotron radiation _cMar 2001 |
||
| 300 |
_a569-71 p. _bdigital |
||
| 500 | _aPublication Type: Journal Article | ||
| 700 | 1 | _aHarada, M | |
| 700 | 1 | _aMisaka, J | |
| 700 | 1 | _aTakeuchi, M | |
| 700 | 1 | _aIchihashi, Y | |
| 700 | 1 | _aGoto, F | |
| 700 | 1 | _aIshida, M | |
| 700 | 1 | _aSasaki, T | |
| 700 | 1 | _aAnpo, M | |
| 773 | 0 |
_tJournal of synchrotron radiation _gvol. 8 _gno. Pt 2 _gp. 569-71 |
|
| 856 | 4 | 0 |
_uhttps://doi.org/10.1107/s090904950001712x _zAvailable from publisher's website |
| 999 |
_c11437504 _d11437504 |
||