000 01171 a2200301 4500
005 20250513190233.0
264 0 _c19990922
008 199909s 0 0 eng d
022 _a1059-910X
024 7 _a10.1002/(SICI)1097-0029(19990715)46:2<130::AID-JEMT6>3.0.CO;2-O
_2doi
040 _aNLM
_beng
_cNLM
100 1 _aHolmestad, R
245 0 0 _aUse of quantitative convergent-beam electron diffraction in materials science.
_h[electronic resource]
260 _bMicroscopy research and technique
_cJul 1999
300 _a130-45 p.
_bdigital
500 _aPublication Type: Journal Article; Research Support, Non-U.S. Gov't; Research Support, U.S. Gov't, Non-P.H.S.; Review
650 0 4 _aAlloys
650 0 4 _aMaterials Testing
650 0 4 _aMetals
650 0 4 _aMicroscopy, Electron
_xinstrumentation
650 0 4 _aSemiconductors
700 1 _aBirkeland, C R
700 1 _aMarthinsen, K
700 1 _aHøier, R
700 1 _aZuo, J M
773 0 _tMicroscopy research and technique
_gvol. 46
_gno. 2
_gp. 130-45
856 4 0 _uhttps://doi.org/10.1002/(SICI)1097-0029(19990715)46:2<130::AID-JEMT6>3.0.CO;2-O
_zAvailable from publisher's website
999 _c10381521
_d10381521