Single-shot two-photon exposure of commercial photoresist for the production of three-dimensional structures. [electronic resource]

By: Contributor(s): Producer: 20121002Description: 1745-7 p. digitalISSN:
  • 0146-9592
Online resources: In: Optics letters vol. 23
Tags from this library: No tags from this library for this title. Log in to add tags.
Star ratings
    Average rating: 0.0 (0 votes)
No physical items for this record

Publication Type: Journal Article

There are no comments on this title.

to post a comment.