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	1.	High-power modular LED-based illumination systems for mask-aligner lithography. [electronic resource] by Bernasconi, Johana Scharf, Toralf Vogler, Uwe Herzig, Hans Peter Producer: 20180613 In: Optics express vol. 26 Online resources: Available from publisher's website Availability: No items available. Save to lists Add to cart (remove)
	2.	Advanced mask aligner lithography: fabrication of periodic patterns using pinhole array mask and Talbot effect. [electronic resource] by Stuerzebecher, Lorenz Harzendorf, Torsten Vogler, Uwe Zeitner, Uwe D Voelkel, Reinhard Producer: 20110222 In: Optics express vol. 18 Online resources: Available from publisher's website Availability: No items available. Save to lists Add to cart (remove)
	3.	Advanced mask aligner lithography: new illumination system. [electronic resource] by Voelkel, Reinhard Vogler, Uwe Bich, Andreas Pernet, Pascal Weible, Kenneth J Hornung, Michael Zoberbier, Ralph Cullmann, Elmar Stuerzebecher, Lorenz Harzendorf, Torsten Zeitner, Uwe D Producer: 20110202 In: Optics express vol. 18 Online resources: Available from publisher's website Availability: No items available. Save to lists Add to cart (remove)

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