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Results of search for 'au:"Vladár, A E"'
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Authors
Badaroglu, M
Barnes, B M
Battistella, L
Beitia, C
Berggren, K K
Bunday, B D
Celano, U
Chawla, J S
Cizmar, P
Ferrera, J
Hoskins, B D
Jones, S N
Keery, W J
Kline, R J
Larrabee, R D
Ming, B
Postek, M T
Villarrubia, J S
Vladár, A E
Wells, O C
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Topics
Artifacts
Fourier Analysis
Microscopy, Electron, Scanning
Multivariate Analysis
Oxides
Vibration
analysis
methods
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English
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Your search returned 9 results.
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1.
Virtual rough samples to test 3D nanometer-scale scanning electron microscopy stereo photogrammetry.
[electronic resource]
by
Villarrubia, J S
Tondare, V N
Vladár, A E
Publication details:
Proceedings of SPIE--the International Society for Optical Engineering
2016
In:
Proceedings of SPIE--the International Society for Optical Engineering
vol. 9778
Online resources:
Available from publisher's website
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2.
Simulated SEM images for resolution measurement.
[electronic resource]
by
Cizmar, P
Vladár, A E
Ming, B
Postek, M T
Producer:
20081210
In:
Scanning
vol. 30
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3.
Application of the low-loss scanning electron microscope image to integrated circuit technology part II--chemically-mechanically planarized samples.
[electronic resource]
by
Wells, O C
McGlashan-Powell, M
Vladár, A E
Postek, M T
Producer:
20020115
In:
Scanning
vol. 23
Online resources:
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4.
Modeling the point-spread function in helium-ion lithography.
[electronic resource]
by
Winston, Donald
Ferrera, J
Battistella, L
Vladár, A E
Berggren, K K
Producer:
20120823
In:
Scanning
vol. 34
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5.
Electron beam-based metrology after CMOS.
[electronic resource]
by
Liddle, J A
Hoskins, B D
Vladár, A E
Villarrubia, J S
Publication details:
APL materials
2018
In:
APL materials
vol. 6
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6.
Application of the low-loss scanning electron microscope image to integrated circuit technology. Part 1--Applications to accurate dimension measurements.
[electronic resource]
by
Postek, M T
Vladár, A E
Wells, O C
Lowney, J L
Producer:
20011101
In:
Scanning
vol. 23
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7.
Image sharpness measurement in the scanning electron-microscope--part III.
[electronic resource]
by
Zhang, N F
Postek, M T
Larrabee, R D
Vladár, A E
Keery, W J
Jones, S N
Producer:
19991028
In:
Scanning
vol. 21
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8.
Scanning electron microscope measurement of width and shape of 10nm patterned lines using a JMONSEL-modeled library.
[electronic resource]
by
Villarrubia, J S
Vladár, A E
Ming, B
Kline, R J
Sunday, D F
Chawla, J S
List, S
Producer:
20150820
In:
Ultramicroscopy
vol. 154
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9.
Metrology for the next generation of semiconductor devices.
[electronic resource]
by
Orji, N G
Badaroglu, M
Barnes, B M
Beitia, C
Bunday, B D
Celano, U
Kline, R J
Neisser, M
Obeng, Y
Vladar, A E
Publication details:
Nature electronics
2018
In:
Nature electronics
vol. 1
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