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Results of search for 'au:"Sommargren, G"'
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Authors
Attwood, D
Beguiristain, R
Bokor, J
Ceglio, N
Ceglio, N M
Demarest, F C
Hawryluk, A M
Hostetler, R E
Jackson, K
Kania, D R
Koike, M
Nguyen, K
Seppala, L G
Sommargren, G
Sommargren, G E
Spallas, J P
Sweeney, D W
Thompson, B J
Truax, B E
Weaver, H J
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Your search returned 11 results.
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1.
Optical heterodyne profilometry.
[electronic resource]
by
Sommargren, G E
Producer:
20121002
In:
Applied optics
vol. 20
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2.
Double-exposure holographic interferometry using commonpath reference waves.
[electronic resource]
by
Sommargren, G E
Producer:
20121002
In:
Applied optics
vol. 16
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3.
Diffraction of light by an opaque sphere. 1: Description and properties of the diffraction pattern.
[electronic resource]
by
Sommargren, G E
Weaver, H J
Producer:
20121002
In:
Applied optics
vol. 29
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4.
Diffraction of light by an opaque sphere. 2: Image formation and resolution considerations.
[electronic resource]
by
Sommargren, G E
Weaver, H J
Producer:
20121002
In:
Applied optics
vol. 31
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5.
Harmonic diffractive lenses.
[electronic resource]
by
Sweeney, D W
Sommargren, G E
Producer:
20121002
In:
Applied optics
vol. 34
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6.
Linear phase microscopy.
[electronic resource]
by
Sommargren, G E
Thompson, B J
Producer:
20121002
In:
Applied optics
vol. 12
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7.
Condenser optics, partial coherence, and imaging for soft-x-ray projection lithography.
[electronic resource]
by
Sommargren, G E
Seppala, L G
Producer:
20130704
In:
Applied optics
vol. 32
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8.
Front-end design issues in soft-x-ray projection lithography.
[electronic resource]
by
Ceglio, N M
Hawryluk, A M
Sommargren, G E
Producer:
20130704
In:
Applied optics
vol. 32
Online resources:
Available from publisher's website
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9.
Laser Doppler velocimeter for velocity and length measurements of moving surfaces.
[electronic resource]
by
Truax, B E
Demarest, F C
Sommargren, G E
Producer:
20121002
In:
Applied optics
vol. 23
Online resources:
Available from publisher's website
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10.
Fabrication of extreme-ultraviolet point-diffraction interferometer aperture arrays.
[electronic resource]
by
Spallas, J P
Hostetler, R E
Sommargren, G E
Kania, D R
Producer:
20121002
In:
Applied optics
vol. 34
Online resources:
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11.
Undulator radiation for at-wavelength interferometry of optics for extreme-ultraviolet lithography.
[electronic resource]
by
Attwood, D
Sommargren, G
Beguiristain, R
Nguyen, K
Bokor, J
Ceglio, N
Jackson, K
Koike, M
Underwood, J
Producer:
20130704
In:
Applied optics
vol. 32
Online resources:
Available from publisher's website
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