Nonlinear imaging microscopy for assessing structural and photochemical modifications upon laser removal of dammar varnish on photosensitive substrates. [electronic resource]

By:

Oujja, M

Contributor(s):

Psilodimitrakopoulos, S
Carrasco, E
Sanz, M
Philippidis, A
Selimis, A
Pouli, P
Filippidis, G
Castillejo, M

Producer: 20180205Description: 22836-22843 p. digitalISSN:

1463-9084

Online resources:

Available from publisher's website

In: Physical chemistry chemical physics : PCCP vol. 19

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Nonlinear imaging microscopy for assessing structural and photochemical modifications upon laser removal of dammar varnish on photosensitive substrates.

APA

Oujja M., Psilodimitrakopoulos S., Carrasco E., Sanz M., Philippidis A., Selimis A., Pouli P., Filippidis G. & Castillejo M. (20180205). Nonlinear imaging microscopy for assessing structural and photochemical modifications upon laser removal of dammar varnish on photosensitive substrates. : Physical chemistry chemical physics : PCCP.

Chicago

Oujja M, Psilodimitrakopoulos S, Carrasco E, Sanz M, Philippidis A, Selimis A, Pouli P, Filippidis G and Castillejo M. 20180205. Nonlinear imaging microscopy for assessing structural and photochemical modifications upon laser removal of dammar varnish on photosensitive substrates. : Physical chemistry chemical physics : PCCP.

Harvard

Oujja M., Psilodimitrakopoulos S., Carrasco E., Sanz M., Philippidis A., Selimis A., Pouli P., Filippidis G. and Castillejo M. (20180205). Nonlinear imaging microscopy for assessing structural and photochemical modifications upon laser removal of dammar varnish on photosensitive substrates. : Physical chemistry chemical physics : PCCP.

MLA

Oujja M, Psilodimitrakopoulos S, Carrasco E, Sanz M, Philippidis A, Selimis A, Pouli P, Filippidis G and Castillejo M. Nonlinear imaging microscopy for assessing structural and photochemical modifications upon laser removal of dammar varnish on photosensitive substrates. : Physical chemistry chemical physics : PCCP. 20180205.

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