APA

Mulaosmanovic H., Ocker J., Müller S., Schroeder U., Müller J., Polakowski P., Flachowsky S., van Bentum R., Mikolajick T. & Slesazeck S. (20180727). Switching Kinetics in Nanoscale Hafnium Oxide Based Ferroelectric Field-Effect Transistors. : ACS applied materials & interfaces.

Chicago

Mulaosmanovic Halid, Ocker Johannes, Müller Stefan, Schroeder Uwe, Müller Johannes, Polakowski Patrick, Flachowsky Stefan, van Bentum Ralf, Mikolajick Thomas and Slesazeck Stefan. 20180727. Switching Kinetics in Nanoscale Hafnium Oxide Based Ferroelectric Field-Effect Transistors. : ACS applied materials & interfaces.

Harvard

Mulaosmanovic H., Ocker J., Müller S., Schroeder U., Müller J., Polakowski P., Flachowsky S., van Bentum R., Mikolajick T. and Slesazeck S. (20180727). Switching Kinetics in Nanoscale Hafnium Oxide Based Ferroelectric Field-Effect Transistors. : ACS applied materials & interfaces.

MLA

Mulaosmanovic Halid, Ocker Johannes, Müller Stefan, Schroeder Uwe, Müller Johannes, Polakowski Patrick, Flachowsky Stefan, van Bentum Ralf, Mikolajick Thomas and Slesazeck Stefan. Switching Kinetics in Nanoscale Hafnium Oxide Based Ferroelectric Field-Effect Transistors. : ACS applied materials & interfaces. 20180727.