Reduction of charge impurities in a silicon metal-oxide-semiconductor quantum dot qubit device patterned with nano-imprint lithography. [electronic resource]

By: Contributor(s): Publication details: Nanotechnology Nov 2019Description: 465302 p. digitalISSN:
  • 1361-6528
Online resources: In: Nanotechnology vol. 30
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Publication Type: Journal Article

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