Reduction of charge impurities in a silicon metal-oxide-semiconductor quantum dot qubit device patterned with nano-imprint lithography. [electronic resource]
Publication details: Nanotechnology Nov 2019Description: 465302 p. digitalISSN:- 1361-6528
No physical items for this record
Publication Type: Journal Article
There are no comments on this title.
Log in to your account to post a comment.